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1.
Wang, Q.; Stradins, P.; Teplin, C.; Branz, H. M.
(2009). Method for Rapid, Controllable Growth and Thickness, of Epitaxial Silicon Films. U.S. Patent No. 7,601,215 B1.
14 pp.; NREL Report No. PT-520-47026.
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2.
Martin, I. T.; Branz, H. M.; Stradins, P.; Young, D. L.; Reedy, R. C.; Teplin, C. W.
(2009). Doping of High-Quality Epitaxial Silicon Grown by Hot-Wire Chemical Vapor Deposition Near 700 ..deg..C.
Thin Solid Films. Vol. 517(12), 2009;
pp. 3496-3498; NREL Report No. JA-520-45852.
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3.
Taylor, M. P.; Readey, D. W.; van Hest, M. F. A. M.; Teplin, C. W.; Alleman, J. L.; Dabney, M. S.; Gedvilas, L. M.; Keyes, B. M.; To, B.; Perkins, J. D.; Ginley, D. S.
(2008). Remarkable Thermal Stability of Amorphous In-Zn-O Transparent Conductors.
Advanced Functional Materials. Vol. 18(20), October 2008;
pp. 3169-3178; NREL Report No. JA-520-44861.
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4.
Branz, H. M.; Teplin, C. W.; Young, D. L.; Page, M. R.; Iwaniczko, E.; Roybal, L.; Bauer, R.; Mahan, A. H.; Xu, Y.; Stradins, P.; Wang, T.; Wang, Q.
(2008). Recent Advances in Hot-Wire CVD R&D at NREL: From 18% Silicon Heterojunction Cells to Silicon Epitaxy at Glass-Compatible Temperatures.
Thin Solid Films. Vol. 516(5), 15 January 2008;
pp. 743-746; NREL Report No. JA-520-40835.
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5.
Jiang, C.-S.; Yan, B.; Yan, Y.; Teplin, C. W.; Reedy, R.; Moutinho, H. R.; Al-Jassim, M. M.; Yang, J.
(2008). P-Induced Nanocrystallite Dispersion in Amorphous-Nanocrystalline Mixed-Phase Si:H Thin Films. Article No. 063515.
Journal of Applied Physics. Vol. 103(6), March 2008;
6 pp.; NREL Report No. JA-520-41577.
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6.
Teplin, C. W.; Martin, I. T.; Jones, K. M.; Young, D.; Romero, M. J.; Reedy, R. C.; Branz, H. M.; Stradins, P.
(2008). Quality and Growth Rate of Hot-Wire Chemical Vapor Deposition Epitaxial Si Layers. Paper No. 1066-A11-06.
Nathan, A., et al., eds.
Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2008: Proceedings of the Materials Research Society Symposium, 25-28 March 2008, San Francisco, California. Materials Research Society Symposium Proceedings, Vol. 1066.
Warrendale, PA: Materials Research Society
pp. 285-289; NREL Report No. CP-520-43193.
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7.
Teplin, C. W.; Jiang, C. S.; Stradins, P.; Branz, H. M.
(2008). Cone Kinetics Model for Two-Phase Film Silicon Deposition. Article No. 093114.
Applied Physics Letters. Vol. 92(9), 2008;
3 pp.; NREL Report No. JA-520-43128.
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8.
Yan, B.; Yue, G.; Yan, Y.; Jiang, C. S.; Teplin, C. W.; Yang, J.; Guha, S.
(2008). Correlation of Hydrogen Dilution Profiling to Material Structure and Device Performance of Hydrogenated Nanocrystalline Silicon Solar Cells. Paper No. 1066-A03-03.
Nathan, A., et al., eds.
Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2008: Proceedings of the Materials Research Society Symposium, 25-28 March 2008, San Francisco, California. Materials Research Society Symposium Proceedings, Vol. 1066.
Warrendale, PA: Materials Research Society
pp. 61-66; NREL Report No. CP-520-46106.
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9.
Branz, H. M.; Stradins, P.; Teplin, C. W.
(2008). Cone Kinetics Model: Insights into the Morphologies of Mixed-Phase Silicon Film Growth. Paper No. 1066-A01-03.
Nathan, A., et al., eds.
Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2008: Proceedings of the Materials Research Society Symposium, 25-28 March 2008, San Francisco, California. Materials Research Society Symposium Proceedings, Vol. 1066.
Warrendale, PA: Materials Research Society
pp. 15-19; NREL Report No. CP-520-46105.
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10.
Perkins, J. D.; van Hest, M. F. A. M.; Teplin, C. W.; Dabney, M. S.; Ginley, D. S.
(2007). In Situ Etch Rate Measurements of Thin Film Combinatorial Libraries.
Applied Surface Science. Vol. 254(3), 2007;
pp. 687-691; NREL Report No. JA-520-42605.
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