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1.
Liu, F.; Jones, K. M.; Xu, Y.; Nemeth, W.; Lohr, J.; Neilson, J.; Romero, M. J.; Al-Jassim, M. M.; Young, D. L.
(2009). Ultrahigh-Crystalline-Quality Silicon Pillars Formed by Millimeter-Wave Annealing of Amorphous Silicon on Glass.
Advanced Materials. Vol. 21(29), 2009;
pp. 3002-3006; NREL Report No. JA-520-46618.
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2.
Martin, I. T.; Branz, H. M.; Stradins, P.; Young, D. L.; Reedy, R. C.; Teplin, C. W.
(2009). Doping of High-Quality Epitaxial Silicon Grown by Hot-Wire Chemical Vapor Deposition Near 700 ..deg..C.
Thin Solid Films. Vol. 517(12), 2009;
pp. 3496-3498; NREL Report No. JA-520-45852.
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3.
Young, D. L.; Branz, H. M.; Liu, F.; Reedy, R.; To, B.; Wang, Q.
(2009). Electron Transport and Band Structure in Phosphorus-Doped Polycrystalline Silicon Films. Article No. 033715.
Journal of Applied Physics. Vol. 105(3), 2009;
7 pp.; NREL Report No. JA-520-44933.
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4.
Branz, H. M.; Teplin, C. W.; Young, D. L.; Page, M. R.; Iwaniczko, E.; Roybal, L.; Bauer, R.; Mahan, A. H.; Xu, Y.; Stradins, P.; Wang, T.; Wang, Q.
(2008). Recent Advances in Hot-Wire CVD R&D at NREL: From 18% Silicon Heterojunction Cells to Silicon Epitaxy at Glass-Compatible Temperatures.
Thin Solid Films. Vol. 516(5), 15 January 2008;
pp. 743-746; NREL Report No. JA-520-40835.
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5.
Teplin, C. W.; Martin, I. T.; Jones, K. M.; Young, D.; Romero, M. J.; Reedy, R. C.; Branz, H. M.; Stradins, P.
(2008). Quality and Growth Rate of Hot-Wire Chemical Vapor Deposition Epitaxial Si Layers. Paper No. 1066-A11-06.
Nathan, A., et al., eds.
Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2008: Proceedings of the Materials Research Society Symposium, 25-28 March 2008, San Francisco, California. Materials Research Society Symposium Proceedings, Vol. 1066.
Warrendale, PA: Materials Research Society
pp. 285-289; NREL Report No. CP-520-43193.
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341 KB
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6.
Young, D. L.; Egaas, B.; Pinegar, S.; Stradins, P.
(2008). New Real-Time Quantum Efficiency Measurement System: Preprint.
7 pp.; NREL Report No. CP-520-42509.
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7.
Coutts, T. J.; Young, D. L.
(2008). Comment on 'Bandgap and Effective Mass of Epitaxial Cadmium Oxide' [Appl. Phys. Lett. 92, 022101 (2008)]. Article No. 106103.
Applied Physics Letters. Vol. 92(10), 2008;
1 pg.; NREL Report No. JA-520-43127.
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8.
Stradins, P.; Kunz, O.; Young, D. L.; Yan, Y.; Jones, K. M.; Xu, Y.; Reedy, R. C.; Branz, H. M.; Aberle, A. G.; Wang, Q.
(2007). Comparative Study of Solid-Phase Crystallization of Amorphous Silicon Deposited by Hot-Wire CVD, Plasma-Enhanced CVD, and Electron-Beam Evaporation. Paper No. 0989-A16-04.
Chu, V., et al., eds.
Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2007: Proceedings of the Materials Research Society Symposium, 9-13 April 2007, San Francisco, California. Materials Research Society Symposium Proceedings, Vol. 989.
Warrendale, PA: Materials Research Society
pp. 391-396; NREL Report No. CP-520-41603.
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9.
Nikolic, M. V.; Ivetic, T.; Young, D. L.; Paraskevopoulos, K. M.; Zorba, T. T.; Blagojevic, V.; Nikolic, P. M.; Vasiljevic-Radovic, D.; Ristic, M. M.
(2007). Far Infrared Properties of Bulk Sintered and Thin Film Zn2SnO4.
Materials Science and Engineering B. Vol. 138(1), 2007;
pp. 7-11; NREL Report No. JA-520-41772.
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10.
Stradins, P.; Teplin, C. W.; Young, D. L.; Yan, Y.; Branz, H. M.; Wang, Q.
(2007). Crystallization of Thin-Film Si Monitored in Real Time by In-situ Spectroscopic Techniques.
Journal of Materials Science: Materials in Electronics. Vol. 18(Suppl. 1), 2007;
pp. S309-S313; NREL Report No. JA-520-40334.
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